Journal Title：Integrated Ferroelectrics

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

《集成鐵電體》為電子工程師和物理學家以及參與集成鐵電體設備研究、設計、開發(fā)、制造和利用的工藝和系統(tǒng)工程師、陶瓷學家和化學家提供了一個國際性的跨學科論壇。此類設備將鐵電薄膜和半導體集成電路芯片結合在一起。其結果是產生了一種新型電子設備，它將鐵電材料獨特的非易失性存儲器、熱電、壓電、光折變、抗輻射、聲學和/或介電特性與半導體集成電路技術的動態(tài)存儲器、邏輯和/或放大特性以及小型化和低成本優(yōu)勢相結合。

Integrated Ferroelectrics創(chuàng)刊于1992年，由Taylor and Francis Ltd.出版商出版，收稿方向涵蓋工程技術 - 工程：電子與電氣全領域，此期刊水平偏中等偏靠后，在所屬細分領域中專業(yè)影響力一般，過審相對較易，如果您文章質量佳，選擇此期刊，發(fā)表機率較高。平均審稿速度 約3.0個月 ，影響因子指數0.7，該期刊近期沒有被列入國際期刊預警名單，廣大學者值得一試。